This indicates a reduction of dot size as Sb beam flux is increased.
变功率PL得知随著Sb量增加，在室温(300K)时第一激发态/基态E。
Three kind of ion beam, N, Ar and Mg ion beam, and nine doses, 1x1014N/cm2, 2x1014N/cm2, 3x1014N/cm2, 5x1014N/cra2, 1x1015N/cm2, 2x1015N/cm2, 3x1015N/cm2, 5X1015N/cm2, 1X1016N/cm2, were applied at transformation induced by ion beam. Among 130 experiments ion beam inducing plasmid DNA directly transfer the E. coli, 8 of which succeeded. Although transformational rate is low, some law were found: Ar ion beam was superior to N and Mg ion beam; The dose 1-3 X 1015N/cm2 was more help for ion-beam transformation; For plasmid DNA, superhelix DNA was more efficient than lined DNA and 20 u g/ml DNA was better concentration.
本研究用氮、氩、镁三种离子，1×10~(14)N／cm~2，2×10~(14)N／cm~2，3×10~(14)N／cm~2，5×10~(14)N／cm~2，1×10~(15)N／cm~2，2×10~(15)N／cm~2，3×10~(15)N／cm~2，5×10~(15)N／cm~2，1×10~(16)N／cm~2九个剂量注入E.coli介导质粒转化130次，成功转化8次，转化子数最低1个，最高14个，虽然总体转化率很低，实验的重复性很差，但是也找到了一些规律：氩离子注入比氮离子注入有利于转化，1-3×10~(15)N／cm~2剂量为理想的剂量，超螺旋状态质粒DNA比线形的转化效率高，能量20keY时较为理想，20μg／ml的质粒DNA是较为合适的浓度。
A simulation result indicates that the normalized transverse RMS emittance for electron beam of 1.5nC is 1.612πmmmrad, electron energy E=5.71MeV.
结果表明，设计的腔体对单圈1.5nC束团，在枪出口后1.2m处，电子能量为5.7MeV，横向归一化发射度ε=1.612πmmmrad。
By opening an institutional form of points:(1) Tap E disk weave machine, using cam (commonly known as tread plate, peach dish), so that the rise and fall heald frames, heald frames is relatively small, as the 2-8 films, used for weaving a simple fabric, such as plain, twill, satin and so simple; (2) Dobby Loom, Dobby agencies is usually mounted on the top beam loom can weave a more complex system of small pattern fabric, using the number of heald frames are more usually 8-24 pieces, and its Integrated Box-down from the board or grain pattern paper control; (3) jacquard loom, each warp yarn from a single heald wire controls that can separate up and down, with grain board control the movement of each warp yarn, knitting patterns can be very complex large pattern fabric, such as brocade quilt cover and blankets.
按开口机构形式分：（1）踏E盘织机，利用凸轮，使综框上升和下降，综框数较少，为2—8片，用于织造简单的织物，如平纹、斜纹、简单缎纹等；（2）多臂织机，多臂机构通常装在织机的顶梁上，可织制较复杂的小花纹织物，使用综框数较多一般为8—24片，它的综框升降运动由纹板或纹纸控制；（3）提花织机，每根经纱由单独的综丝控制，可以单独上升和下降，用纹板控制每根经纱的运动，可以织造花纹非常复杂的大花纹织物，如锦缎被面和毛毯等。
This paper describes the aberration and distortion of e-beam deflection magnetic field in which the parameters keep close to in the normal solution.
以电子束偏转磁场的像差和畸变为目标，对参量进行非劣解中找出贴近理想的最优解。
The design and experiment of a compact output switch for a water pulse forming line e-beam accelerator was presented.
介绍了一种水介质脉冲形成线强流电子束加速器的输出开关的设计和实验结果。
The result showed that the photoconductive material of binary blended composite was not found to be used in laser beam printers. The expert group, organized by Science Committee of Zhejiang Province, considered that the achievement was based on our own technology, and was the achievement with new ideas and high technology which reached the international level. 2. In order to broaden the spectrum response range for photoconductors, we blended TiOPc with monoazo pigment (AZO-1), double azo pigments (AZO-2, AZO-3 and AZO-4) based on benzidine as bridge group, double azo pigments (AZO-5, AZO-6, and AZO-7) based on 2, 7-diamino-fluorenone as bridge group respectively.
首次采用这种共混复合物作为光生载流子材料，在自制的环式浸涂装置中制备激光打印光电导鼓，国家法定测试单位-机械工业部天津复印技术研究所的测试其光敏性：E〓=1.2～1.3μJ／cm〓，法定检索单位上海情报所的手工、光盘和计算机国际联机检索结果为：二元共混复合光电导材料应用于激光打印机未见报导，浙江省科委组织的专家鉴定小组认为：此项成果立足于自己的技术，是一项具有创新性的高技术成果，达到了国际先进水平。
The analytic expressions of reflectivity and transmissivity at the front surface of a uniaxial crystal for a beam of incident monochromatic wave are given.
分析了E光波法线方向和光线方向的区别，对E光的菲涅耳方程及反射、透射率公式进行了修正。
The variation of two types of residual stresses, i. e., residual surface stress and indentation residual stress, with annealing temperature in Knoop indented bending beam made of ceramics is studied. It is shown that the residual surface stress generated by machine grinding can be eliminated completely by annealing process, while the residual stress due to indentation can be reduced partly only.
研究了Knoop压痕弯曲梁中两类不同的残余应力——表面机加工残余应力及压痕残余应力随，退火温度的变化规律，发现退火处理可以完全消除由于机加工而导致的表面残余压应力，但只能部分消除由于压痕而导致的裂纹尖端处残余拉应力。
Advanced Electron Beams, whose compact electron beam technology enables traditional manufacturers become more environmentally sustainable while improving profitability, announced at Drinktec 2009 in Munich, Germany the availability of the e25ITB, an electron beam emitter designed for sterilizing the interior surfaces of bottle shaped packaging.
先进的电子束，其紧凑的电子束技术使传统的制造商变得更具环境可持续性的同时提高盈利能力，在Drinktec交易会上宣布，2009年在慕尼黑，德国的e25ITB，一个电子束发射的消毒室内设计的可用性瓶表面形成包装。
Refers to an e-beam evaporator or exposure system.
指电子束蒸发器或曝光系统。
It was found that ion beam assisted deposition at certain parameter could help to increase the quality of the coatings. 4. HfO2 single layer prepared by reactive ion beam assisted deposition had been studied. It was proved to be helpful for decreasing defects density and optical uniformity, but the laser induced damage threthold didn't reach the level of e-gun beam evaption affected by the substoichiometry defects.
研究了离子束辅助反应沉积技术对薄膜缺陷密度和均匀性的改善情况，通过参数的选择获得尽可能高的损伤阈值，但由于化学计量比失衡导致吸收和损伤阈值均未能达到以氧化铪为初始材料电子束蒸发所达到的水平。
E. If you need to screen surface bracket beam welding, all welds should be parallel to the beams, can not be horizontal welding.
e。如果需要在筛面托架横梁上焊接时，所有焊缝应是平行于横梁，不可横向焊接。
In this thesis, proximity effect of E-beam lithography was investigated, including proximity effect parameters and proximity effect correction.
本论文研制之电子束微影技术的邻近效应研究，包含邻近效应参数及邻近效应修正。
The good characteristics of the deflection system of electron gun can be obtained by optimizing the velocity and the location of emitting electron beam and by the aclinic emission of the electron beam, that can be achieved by making the end of the anode and the middle part of the cathode level.
研究结果表明：电子枪阳极板端点与阴极灯丝中心点保持水平可满足电子水平出射；非均匀分布的磁场对e型电子枪中电子束具有良好的聚焦作用；所设计的偏转聚焦系统在电子束流为50~100 mA时，束斑小于3 mm。
In this research, we use E-beam lithography technology to make the line width of silicon-base mold insert structure reach to sub-micron size and then use plasma to etch the depth of structure. Moreover, we implant phosphorous ion into the mold insert to manufacture the circuit which can be charged an electric current to heat the mold insert. Finally, we can decrease the thermal stress, improve the integrity of the structure and make larger area molding during the demolding step by melting the material again which is beginning to solidify.
本研究导入电子束曝光微影的技术，使矽基模仁的结构线宽达到次微米的大小，再利用电浆蚀刻蚀刻出结构深度，并以离子布植的方法在模仁上制作可通电而使其自发热的电路，最后藉由使冷却开始固化的材料再度接近熔融状态，进而使脱模时的夹持应力降低，减少破坏，改善结构完整性，并促成更大面积的完整脱模成形。
A non-uniform heat source model, i. e., re-absorption non-uniform heat source model that is based on the re-absorption effect of the pump beam was established for the side-pumped laser slab, and the comparison was conducted with the uniform heat source and the one-absorption non-uniform heat source model.
针对激光介质的内热源，以多次吸收作用为基础提出了适用于侧面双向泵浦板状激光介质的不均匀内热源模型，即多次吸收不均匀内热源模型，并与均匀内热源和一次吸收内热源模型进行了对比分析。
The detectors were irradiated with a mono-energetic beam of charged particles, which are protons, alpha particles, oxygen and iron ions.
粒子的能量刻度采用的是1／3档，在ΔE〓探测器中每道能量H〓=0.107MeV／道，在ΔE〓探测器中每道能量H〓=0.123MeV／道。
Structures and polarization principles of the polarizing prisms such as the Glan-Thompson prism or the Glan-Taylor prism, beam splitter prisms such as the Wollaston prism or the Rochon prism and their beam splitting principles, the operating principle and features of the phase delay plate, the operating principle and the classification of the achromatic phase delay devices, along with the depolarization devices are all presented.
第2页 为了更精确的确定各个波长和各个温度下的冰洲石晶体的折射率值；在第三章中，首先介绍了冰洲石晶体的材料性质，引入了色散的概念及修正的％11.e i er方程；文中精确地求解出Sellmeier方程的各常数表达式，这些常数可通过不同波长所对应的折射率值求解。
THE VESSEL MUST BE EQUIPPED DERRICKS/CRANES WITH UNLOADING CAPACITY AT LEAST 1, 200.00 TONS/DAY. 10.3 UPON SAILING FOR UNLOADING PORT, THE SELLER SHALL NOTIFY THE BUYER OR HIS AUTHORISED AGENT AT DESTINATION PORT OF FOLLOWING:- A NAME OF SHIP B NATIONALITY OF SHIP C CONTRACT NUMBER D QUANTITY LOADED E LOA/BEAM F NUMBER OF HOLDS/HATCHES/CRANES/DERRICKS G AGE OF SHIP H FLAG OF SHIP 10.4 NO LATER THAN 72 HOURS FOLLOWING COMPLETION OF LOADING, SELLER'S SHIPPING REPRESENTATIVE SHALL FAX OR EMAIL TO BUYER THE FOLLOWING DATA:-- NAME OF VESSEL - SAILING DATE - QUANTITY/WEIGHT LOADED - ETA AT NOMINATED DISCHARGE PORT 10.5 MARINE INSURANCE TO BE FOR SELLER`S RESPONSIBILITY AND ACCOUNT FOR 110% VALUE ALL-RISKS CONDITION.
船上必须配备井架/起重机卸下容量至少雷亚尔吨/每日3月10日在航港卸货，卖方应通知买方在目的地港口或其授权的代理人：-一船舶名称二船舶国籍三合同编号四装载量五协议书/梁六持有数量/舱口/起重机/井架七船龄八4月10日旗舰不迟72(72)分装完成后，卖方船运代表应以传真或电子邮件买方下列资料：-姓名艇出航日期数量/重量装载-港口卸货提名埃塔在5月10日将进行海上保险卖方的责任和价值占110%全险状态。